Machine Design

Dual-mode plasma etching system - Plasma Etch

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in.2 of active processing surface with the three-level standard configuration.
The unit has directional electrodes for reactive ion etching for drilling microvias or cleaning small variations that can't be reached with chemicals. The isotropic etching/cleaning mode isn't directional.

Plasma Etch, 3522 Arrowhead Dr., Carson City, NV 89706, (775)883-1336,  www.plasmaetch.com

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