The GP200 Series is a fully pressure-insensitive pressure-based mass flow controller (P-MFC) designed specifically for etch and chemical vapor deposition (CVD) processes in semiconductor manufacturing. Mass flow controllers (MFCs) are the most important component in the gas delivery systems used to produce silicon wafers. MFCs must precisely deliver inert, corrosive and reactive gases to the process chamber, even when operating at very low vapor pressures.
The P-MFC operates well in high-vacuum conditions and above atmospheric pressure conditions that are intrinsic to etch and CVD processes. In comparison, conventional discrete P-MFCs can operate under high-vacuum conditions but degrade in performance and control range as the outlet pressures increase. By offering a greater operating range than conventional P-MFCs, the GP200 Series can improve etch process performance and expand the application scope to include CVD processes.