Dual-mode plasma etching system - Plasma Etch

Oct. 14, 2011
The system can perform both anisotropic reactive ion etching and isotropic etching/cleaning.

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in.2 of active processing surface with the three-level standard configuration.
The unit has directional electrodes for reactive ion etching for drilling microvias or cleaning small variations that can't be reached with chemicals. The isotropic etching/cleaning mode isn't directional.

Plasma Etch, 3522 Arrowhead Dr., Carson City, NV 89706, (775)883-1336,  www.plasmaetch.com

Sponsored Recommendations

MOVI-C Unleashed: Your One-Stop Shop for Automation Tasks

April 17, 2024
Discover the versatility of SEW-EURODRIVE's MOVI-C modular automation system, designed to streamline motion control challenges across diverse applications.

Navigating the World of Gearmotors and Electronic Drives

April 17, 2024
Selecting a gearmotor doesn’t have to be a traumatic experience. The key to success lies in asking a logical sequence of thoughtful questions.

The Power of Automation Made Easy

April 17, 2024
Automation Made Easy is more than a slogan; it signifies a shift towards smarter, more efficient operations where technology takes on the heavy lifting.

Lubricants: Unlocking Peak Performance in your Gearmotor

April 17, 2024
Understanding the role of lubricants, how to select them, and the importance of maintenance can significantly impact your gearmotor's performance and lifespan.

Voice your opinion!

To join the conversation, and become an exclusive member of Machine Design, create an account today!